We are delighted to present to you our very first webinar on ‘The Journey of the Transistor’ and ‘EUV Lithography’, organized by IEEE EDS SB DU. This session will be open to all. All interested participants are requested to register through the registration link given below. A zoom link of the session will be sent to the registered participants in due time.

Details about the Webinar:

Registration Link: https://docs.google.com/…/1T9u5KEsHr8ofsVxT…/viewform…

Date: Sunday, 13 June 2021
Time: 7:00 P.M. (BST)
Type: Online
Platform: Zoom
Zoom Link: A zoom link will be provided to the registered participants.
For any query, e-mail us at ieeeedssbcdu@gmail.com

Part (1): Journey of the Transistor

Speaker:
Dr. Anisul Haque
Faculty Member
Department of Electrical and Electronic Engineering
Faculty of Sciences and Engineering
East West University, Dhaka – 1212, Bangladesh.
IEEE EDS Distinguished Lecturer

Abstract of the Talk:
The metal–oxide–semiconductor field-effect transistor (MOSFET), also known as the MOS transistor, was invented by Mohamed Atalla and Dawon Kahng in 1959. The MOSFET was the first truly compact transistor that could be miniaturised and mass-produced for a wide range of uses. With its high scalability, and much lower power consumption and higher density than bipolar junction transistors, the MOSFET made it possible to build high-density integrated circuits, allowing the integration of more than 10,000 transistors in a single IC. In this talk, our honorable speaker will discuss the evolution of MOSFETs, a few challenges that were faced on the way, and how those obstacles were overcome. The talk will also cover how the MOSFETs are used in the present day and what the next possible competence of the transistor will be in the upcoming future.

Speaker Biography:
Dr. Anisul Haque is and has been working as a Professor in the Department of Electrical and Electronic Engineering, East West University since 2006. He has also served as the Chairperson of the Department of EEE and the Dean of the Faculty of Sciences and Engineering. Before joining East West University, he taught at the Electrical and Electronic Engineering Department, BUET for eighteen years. He has been a visiting faculty at Tokyo Institute of Technology, Japan, University of Connecticut, USA, and Clarkson University, USA. Dr. Haque’s research interests include the physics, modeling, simulation, and characterization of nano-electronic devices and photovoltaic devices and systems. He is also interested in engineering education. Dr. Haque is the recipient of the Bangladesh University Grants Commission Award in 2006 and the gold medal from the Bangladesh Academy of Science in 2010. Dr. Haque was an editor of IEEE Transactions on Electron Devices until 2019. Currently, he is serving as an associate editor of IEEE Access. He is the founding Chair of IEEE Electron Devices Society, Bangladesh Chapter. He has been serving as an IEEE Distinguished Lecturer since 2009. He also serves in the Board of Accreditation for Engineering and Technical Education (BAETE), Institute of Engineers, Bangladesh (IEB) as a board member. Dr. Haque has conducted many training and workshop sessions on Outcome Based Education (OBE) for academic program leaders and BAETE program evaluators.

Part (2): EUV Lithography: Pushing Moore’s Law Forward

Speaker:
Yassin Chowdhury
Senior Design Engineer
EUV Source Metrology at ASML
The Netherlands.

Abstract of the Talk:
EUV lithography refers to extreme ultraviolet lithography, a technology that is expected to bring a radical progress to one of the most important steps in semiconductor manufacturing, photolithography. EUVL is now a prominent patterning technology that is making the process of chip manufacturing more reliable and more accurate. In the world of chip manufacturing, realizing finer circuits is a must, as it enables integration of a greater number of components inside a chip and therefore building a faster and more energy-efficient chip. The utilization of a EUV light source will allow for defining finer and denser patterns than previous methods like Optical Lithography because of its shorter wavelength, which is essential since light isn’t able to directly define features smaller than its own wavelength. During this short technical talk, the speaker will explain how EUV patterning is pushing volume production of microchips to smaller nodes to enable faster and affordable electronics required for next-generation applications like 5G, IoT, AI, machine learning, quantum computing, etc. The talk will discuss patterning in general, how EUV works, as well as the challenges and outlook for the future.

Speaker Biography:
Yassin Chowdhury is currently a Functional Architect, EUV Source Metrology, ASML Netherlands B.V. His work focuses on the state-of-the-art optical metrology module used in the EUV source of Twinscan photolithography tools. Yassin has been working with ASML for 9+ years, before joining EUV source 2 years ago he worked in the DUV and EUV scanner in many projects as an optical design engineer, mainly concerning different metrology techniques, interferometry, and image sensors. Before joining ASML, Mr. Yassin did his Master’s in Photonics in Belgium (UGent and VUB) and Sweden (KTH). Before coming to Europe, he was a system engineer in Grameenphone, Bangladesh. Yassin completed his B.Sc. and M.Sc. degrees from the Department of Applied Physics, Electronics, and Communication Engineering at the University of Dhaka, Bangladesh.